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3D TCAD Simulation for CMOS Nanoeletronic Devices
Kategorie
Beschreibung
036a
XB-SG
037b
eng
087q
978-981-10-3065-9
100
Wu, Yung-Chun
104b
Jhan, Yi-Ruei
331
3D TCAD Simulation for CMOS Nanoeletronic Devices
410
Singapore
412
Springer
425
2018
425a
2018
433
Online-Ressource (XIII, 330 p. 243 illus., 240 illus. in color, online resource)
451b
SpringerLink. Bücher
527
Druckausg.ISBN: 978-981-10-3065-9
527
Printed editionISBN: 978-981-10-3065-9
540a
ISBN 978-981-10-3066-6
700
|TEC008070
700
|TJF
700
|TEC008000
700b
|621.381
700c
|TK7800-8360
700c
|TK7874-7874.9
750
This book demonstrates how to use the Synopsys Sentaurus TCAD 2014 version for the design and simulation of 3D CMOS (complementary metal-oxide-semiconductor) semiconductor nanoelectronic devices, while also providing selected source codes (Technology Computer-Aided Design, TCAD). Instead of the built-in examples of Sentaurus TCAD 2014, the practical cases presented here, based on years of teaching and research experience, are used to interpret and analyze simulation results of the physical and electrical properties of designed 3D CMOSFET (metal-oxide-semiconductor field-effect transistor) nanoelectronic devices. The book also addresses in detail the fundamental theory of advanced semiconductor device design for the further simulation and analysis of electric and physical properties of semiconductor devices. The design and simulation technologies for nano-semiconductor devices explored here are more practical in nature and representative of the semiconductor industry, and as such can promote the development of pioneering semiconductor devices, semiconductor device physics, and more practically-oriented approaches to teaching and learning semiconductor engineering. The book can be used for graduate and senior undergraduate students alike, while also offering a reference guide for engineers and experts in the semiconductor industry. Readers are expected to have some preliminary knowledge of the field
753
Introduction of Synopsys Sentaurus TCAD 2014 version software environment operation interface and tools -- Simulation analysis of 2D MOSFET -- Simulation analysis of 3D FinFET with LG = 15 nm -- Simulation analysis of Inverter and SRAM of 3D FinFET with LG = 15 nm -- Simulation analysis of GAA NWFET -- Simulation analysis of Junctionless FET with LG = 10 nm -- Simulation analysis of Tunnel FET -- Simulation analysis of Si and Ge 3D FinFET with LG = 3 nm
012
490760961
081
Wu, Yung-Chun: 3D TCAD Simulation for CMOS Nanoeletronic Devices
100
Springer E-Book
125a
Elektronischer Volltext - Campuslizenz
655e
$uhttp://dx.doi.org/10.1007/978-981-10-3066-6
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