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- Thin films: proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] Thin films: proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994]UP 7500 H447 1 -
Titel: Thin films: proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994]
Verfasser:
Jahr: 1994
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- Solid surfaces, interfaces and thin films: with 13 tables Lüth, Hans Solid surfaces, interfaces and thin films: with 13 tablesUP 7500 L948(4) 2 -
Titel: Solid surfaces, interfaces and thin films: with 13 tables
Verfasser: Lüth, Hans
Jahr: 2001
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- Solid surfaces, interfaces and thin films Lüth, Hans Solid surfaces, interfaces and thin filmsUP 7500 L948(5) 3 -
Titel: Solid surfaces, interfaces and thin films
Verfasser: Lüth, Hans
Jahr: 2010
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- Film deposition by plasma techniques: with 30 tables Konuma, Mitsuharu Film deposition by plasma techniques: with 30 tablesUP 7550 K82 4 -
Titel: Film deposition by plasma techniques: with 30 tables
Verfasser: Konuma, Mitsuharu
Jahr: 1992
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- Nucleation and growth of thin films Lewis, Brian Nucleation and growth of thin filmsUP 7550 L673 5 -
Titel: Nucleation and growth of thin films
Verfasser: Lewis, Brian
Jahr: 1978
Lit.abteilungen: Freihand.
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- Thin films of Copper oxide and Copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices Wächtler, Thomas Thin films of Copper oxide and Copper grown by atomic layer deposition for applications in metallization systems of microelectronic devicesUP 7550 W126 6 -
Titel: Thin films of Copper oxide and Copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices
Verfasser: Wächtler, Thomas
Jahr: 2010
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- ¬Das¬ Dünnschichtspektrum: ein Zugang von den Grundlagen zur Spezialliteratur Stenzel, Olaf ¬Das¬ Dünnschichtspektrum: ein Zugang von den Grundlagen zur SpezialliteraturUP 7800 S826 7 -
Titel: ¬Das¬ Dünnschichtspektrum: ein Zugang von den Grundlagen zur Spezialliteratur
Verfasser: Stenzel, Olaf
Jahr: 1996
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- Adhesion measurement of films and coatings [proceedings of the International Symposium on Adhesion Measurement of Films and Coatings held in Boston, 5 - 7 December, 1992] Adhesion measurement of films and coatings [proceedings of the International Symposium on Adhesion Measurement of Films and Coatings held in Boston, 5 - 7 December, 1992]UP 7990 M685-1 8 -
Titel: Adhesion measurement of films and coatings [proceedings of the International Symposium on Adhesion Measurement of Films and Coatings held in Boston, 5 - 7 December, 1992]
Verfasser:
Jahr: 1995
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- ¬The¬ physics of thin film optical spectra: an introduction Stenzel, Olaf ¬The¬ physics of thin film optical spectra: an introductionUP 8000 S826 9 -
Titel: ¬The¬ physics of thin film optical spectra: an introduction
Verfasser: Stenzel, Olaf
Jahr: 2005
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.
- Principles of plasma discharges and materials processing Lieberman, Michael A. Principles of plasma discharges and materials processingUR 8000 L716(2) 10 -
Titel: Principles of plasma discharges and materials processing
Verfasser: Lieberman, Michael A.
Jahr: 2005
Lit.abteilungen: Freihand.
Verfügbar in: Hauptbibliothek.


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